| 标题 |
Atomic Layer Etching of HfO 2 and ZrO 2 Using NbF 5 and TiCl 4 in High-Aspect-Ratio Three-Dimensional Nanohole Structures |
| 网址 | |
| DOI | |
| 其它 |
期刊:Chemistry of Materials 作者:Boyun Choi; Getasew Mulualem Zewdie; Hyeyoung Shin; Nari Jeon 出版日期:2026-01-13 |
| 求助人 | |
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(2025-6-4)