| 标题 |
Thickness scaling down to 5 nm of ferroelectric ScAlN on CMOS compatible molybdenum grown by molecular beam epitaxy |
| 网址 | |
| DOI | |
| 其它 |
期刊:Applied Physics Letters 作者:Ding Wang; Ping Wang; Shubham Mondal; Mingtao Hu; Danhao Wang; et al 出版日期:2023-01-30 |
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(2025-6-4)