| 标题 |
Novel hemispherical Halbach array configuration and material removal mechanisms for magnetorheological polishing of polymethyl methacrylate |
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| DOI | |
| 其它 |
期刊:The International Journal of Advanced Manufacturing Technology 作者:Quach Vu Hieu; Nguyen Tien Tung; Le Thi Phuong Thanh; Nguyen Chi Tam; Dao Ngoc Hoanh; et al 出版日期:2026-05-06 |
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(2025-6-4)