| 标题 |
Interfacial delamination investigation between copper bumps in 3D chip stacking package by using the modified virtual crack closure technique |
| 网址 | |
| DOI | |
| 其它 |
期刊:Microelectronic Engineering 作者:C.J. Wu; M.C. Hsieh; C.C. Chiu; M.C. Yew; K.N. Chiang 出版日期:2011-05-01 |
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(2025-6-4)