| 标题 |
Demonstration of Conformal MoS2 on High-Aspect-Ratio Structures up to 40:1 and Exploration of Manufacturability in a 300mm Fab for 3D NAND applications |
| 网址 | |
| DOI | |
| 其它 |
期刊:International Memory Workshop 作者:Hao-Ling Tang; K. Wong; Minrui Yu; Jason Appell; Pei Liu; et al 出版日期:2025-05-18 |
| 求助人 | |
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(2025-6-4)