| 标题 |
Mitigate slit position dependent cd variation with source optimization |
| 网址 | |
| DOI |
10.1117/12.3108584
doi
|
| 其它 |
期刊:Optical and EUV Nanolithography XXXIX 作者:Po-Kai Chang; Chaowei Huang; Peichen Yu 出版日期:2026-04-10 |
| 求助人 | |
| 下载 |
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(2025-6-4)