| 标题 |
Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Hazardous Materials 作者:Tae-Kyoung Kim; Taeyeon Kim; Inae Lee; Kyungho Choi; Kyung‐Duk Zoh 出版日期:2020-08-22 |
| 求助人 | |
| 下载 |
PDF的下载单位、IP信息已删除
(2025-6-4)