| 标题 |
Effect of the H2/N2 Ratio on Molybdenum Nitride Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition: Applications for Next-Generation Interconnects |
| 网址 | |
| DOI | |
| 其它 |
期刊:ACS applied nano materials 作者:Min‐Ji Ha; Na-Gyeong Kang; Eun-Su Chung; Ji‐Hoon Ahn 出版日期:2025-06-13 |
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(2025-6-4)