| 标题 |
Two- and three-dimensional simulation analysis of microwave excited plasma for deposition applications: operation with argon at atmospheric pressure |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Physics D: Applied Physics 作者:M Baeva; F Hempel; H Baierl; T Trautvetter; R Foest; et al 出版日期:2018-07-23 |
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(2025-6-4)