| 标题 |
Extended model for chemically amplified resist with multiple photoacid generators |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of vacuum science and technology 作者:Di Yao; Lisong Dong; Yunyun Hao; Yayi Wei; Ming Fang 出版日期:2025-03-01 |
| 求助人 | |
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(2025-6-4)