| 标题 |
Growth of copper metal by atomic layer deposition using copper(I) chloride, water and hydrogen as precursors |
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| DOI | |
| 其它 |
期刊:Thin Solid Films 作者:Tobias Törndahl; Mikael Ottosson; Jan-Otto Carlsson 出版日期:2004-06-01 |
| 求助人 | |
| 下载 |
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(2025-6-4)