| 标题 |
 Study on the third harmonic diagnosis and etching distribution analysis according to the phase change between the upper and lower RF electrodes in a 60 MHz capacitively coupled plasma triode reactor based high aspect ratio contact dry etching process |
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| DOI | |
| 其它 |
期刊：Journal of vacuum science and technology 作者：Se-Jin Oh; Hyunju Lee; Chang-Soon Lim; J.W. Pi; Kyung-Gon You; et al 出版日期：2025-05-01 |
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(2025-6-4)
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