| 标题 |
Effect of in-cycle nitrogen plasma treatment on plasma-enhanced atomic layer deposited silicon nitride thin films using diiodosilane and ammonia plasma |
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| DOI | |
| 其它 |
期刊:Applications of Surface Science 作者:Tae Ri Yang; Gi-Beom Park; Min Chan Kim; Hyein Park; Ki-Cheol Song; et al 出版日期:2026-10-01 |
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(2025-6-4)