| 标题 |
Solution processed Li-Al2O3/LiNbO3/Li-Al2O3 stacked gate dielectric for a non-volatile ferroelectric thin film transistor |
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| DOI | |
| 其它 |
期刊:Journal of Alloys and Compounds 作者:Nila Pal; Rajarshi Chakraborty; Anand Sharma; Utkarsh Pandey; Vishwas Acharya; et al 出版日期:2023-05-22 |
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(2025-6-4)