| 标题 |
Theoretical and experimental study on the vertical-variable-doping superjunction MOSFET with optimized process window |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Semiconductors 作者:Min Ren; Meng Pi; Rongyao Ma; Xin Zhang; Ziyi Zhou; et al 出版日期:2025-06-14 |
| 求助人 | |
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(2025-6-4)