| 标题 |
POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition |
| 网址 | |
| DOI | |
| 其它 |
期刊:Applied sciences 作者:Haimeng Yu; Shaoshuai Liu; Haiyan Fu; Zepeng Cui; Liangshun Zhang; et al 出版日期:2024-09-02 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人或该文件上传人下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)