| 标题 |
157-nm pellicles for photolithography: mechanistic investigation of the deep-UV photolysis of fluorocarbons |
| 网址 | |
| DOI |
10.1117/12.534381
doi
|
| 其它 |
期刊:SPIE Proceedings 作者:Kwangjoo Lee; Steffen Jockusch; Nicholas J. Turro; Roger H. French; Robert C. Wheland; et al 出版日期:2004-07-21 |
| 求助人 | |
| 下载 |
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(2025-6-4)