| 标题 |
Adsorption-controlled neutral transport in cryogenic high aspect ratio plasma etching |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology A 作者:Junghwan Um; Sunil Moon; Y. Park; S. Son; Sungil Cho 出版日期:2026-04-03 |
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(2025-6-4)