| 标题 |
Evaluation of vacancies in positive-tone non-chemically and chemically amplified EUV / EB resists: relationship between free-volume and LER |
| 网址 | |
| DOI |
10.1117/12.2046659
doi
|
| 其它 |
期刊:Advanced Lithography 作者:A. Oshima; Toru Hinata; Hirotaka Nakamura; T. Oka; N. Oshima; et al 出版日期:2014-03-27 |
| 求助人 | |
| 下载 |
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(2025-6-4)