| 标题 |
Dry etch selectivity of a-C:H hardmasks for sub-65nm patterning applications |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 作者:D. Padhi; B. H. Kim; D. Witty 出版日期:2009-07-18 |
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(2025-6-4)