| 标题 |
Advancing atomic layer deposition through artificial intelligence: Generative modeling and predictive analytics for TiO2 growth rate prediction from TDMAT/O3 |
| 网址 | |
| DOI | |
| 其它 |
期刊:Surface and Coatings Technology 作者:Remya Ampadi Ramachandran; Pouyan Navabi; Majid Jaberi-Douraki; Urmila Diwekar; Cortino Sukotjo; Christos G. Takoudis 出版日期:2026-03-04 |
| 求助人 | |
| 下载 |
PDF的下载单位、IP信息已删除
(2025-6-4)