| 标题 |
Counterbalance of Ti and OH concentrations in tuning the zero thermal expansion behaviour of TiO2-SiO2 glass for use as mask substrate in EUV lithography |
| 网址 | |
| DOI | |
| 其它 |
期刊:Ceramics International 作者:Il Jung Yoon; Hirokazu Masai; Chang-Gi Lee; Se-Ho Kim; Yohei Onodera; et al 出版日期:2026-09-01 |
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(2025-6-4)