| 标题 |
Patterning performance of perfluoroalkyl substances (PFAS) free EUV chemically amplified resists: a step towards environmentally friendly lithographic chemicals |
| 网址 | |
| DOI |
10.1117/12.3052050
doi
|
| 其它 |
期刊:Advances in Patterning Materials and Processes XLII 作者:Danilo De Simone; Emily E. Gallagher 出版日期:2025-04-22 |
| 求助人 | |
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(2025-6-4)