| 标题 |
Comprehensive Analysis of Oxidant Effects During ALD Process of Hf0.5Zr0.5O2 Ferroelectric Thin Films |
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| DOI | |
| 其它 |
期刊:IEEE Electron Devices Technology and Manufacturing Conference 作者:Xiaopeng Li; Yilin Hou; Xiaoyu Dou; Yaoyu He; Yuwei Qu; et al 出版日期:2025-03-09 |
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(2025-6-4)