| 标题 |
Long-Term Operational Stability of Dual-Gated ITO/HfO 2 Field-Effect Transistors via Full Top-Gate Coverage: A Comprehensive Bias-Stress Mapping |
| 网址 | |
| DOI | |
| 其它 |
期刊:ACS Nano 作者:Jianming Huang; Arijit Sarkar; Yajing Chai; Yezhu Lv; Haihui Cai; et al 出版日期:2026-03-02 |
| 求助人 | |
| 下载 |
PDF的下载单位、IP信息已删除
(2025-6-4)