| 标题 |
Improving the Lithographic Performance of Tetranuclear Organotin Resist via Additives with Active Ligands† |
| 网址 | |
| DOI | |
| 其它 |
期刊:Chinese Journal of Chemistry 作者:Hao Li; Huiwen An; Jinping Chen; Tianjun Yu; Yi Zeng; et al 出版日期:2025 |
| 求助人 | |
| 下载 |
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(2025-6-4)