| 标题 |
Investigation of ZrSi2 for application to EUV pellicle |
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| DOI | |
| 其它 |
期刊:International Conference on Extreme Ultraviolet Lithography 2022 作者:Seong Ju Wi; Chang Soo Kim; Haneul Kim; Jaehyuck Choi; Kyoung-Won Seo; et al 出版日期:2022 |
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(2025-6-4)