| 标题 |
Ultrahigh Selective Etching of SiO[sub 2] Using an Amorphous Carbon Mask in Dual-Frequency Capacitively Coupled C[sub 4]F[sub 8]/CH[sub 2]F[sub 2]/O[sub 2]/Ar Plasmas |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of The Electrochemical Society 作者:B. S. Kwon; J. S. Kim; N.-E. Lee; J. W. Shon 出版日期:2010-01-01 |
| 求助人 | |
| 下载 |
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(2025-6-4)