| 标题 |
Chemical vapour etching of Si, SiGe and Ge with HCl; applications to the formation of thin relaxed SiGe buffers and to the revelation of threading dislocations |
| 网址 | |
| DOI | |
| 其它 |
期刊:Semiconductor Science and Technology 作者:Y Bogumilowicz; J M Hartmann; R Truche; Y Campidelli; G Rolland; et al 出版日期:2004-12-21 |
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(2025-6-4)