| 标题 |
Hydrogen depth profiling and multi-energy proton implantation: SIMS as a tool for implant process control |
| 网址 | |
| DOI | |
| 其它 |
期刊:Materials Science in Semiconductor Processing 作者:Orazio Samperi; Lasse Vines; Mario Pietro Bertolini; Massimiliano Cantiano; Salvo Coffa; et al 出版日期:2024-02-10 |
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(2025-6-4)