| 标题 |
Topography simulations for contact formation involving reactive ion etching, sputtering and chemical vapor deposition |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 作者:S. Takagi; S. Onoue; K. Iyanagi; K. Nishitani; T. Shinmura 出版日期:2005-05-01 |
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(2025-6-4)