| 标题 |
Ab-initio investigation of fundamental reaction mechanisms, environmental effects and EUV reactivity of Sn-based metal oxide photoresists |
| 网址 | |
| DOI | |
| 其它 |
期刊:Advances in Patterning Materials and Processes XLIII 作者:Nishat Liza; Kazuki Yamada; Ankur Agarwal; Ihsan Simms; Ryan Burns; et al 出版日期:2026 |
| 求助人 | |
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(2025-6-4)