| 标题 |
Development for high-aspect-ratio hole etching with hydrogen fluoride gas based cryogenic process |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of vacuum science and technology 作者:Ryutaro Suda; Masahiko Yokoi; Du Zhang; Yu-Hao Tsai; Maju Tomura; et al 出版日期:2025-12-01 |
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(2025-6-4)