| 标题 |
Metal-oxide resist height variations through pitch in EUV lithography |
| 网址 | |
| DOI |
10.1117/12.3115935
doi
|
| 其它 |
期刊:41st European Mask and Lithography Conference (EMLC 2026) 作者:Christoph Hauenstein; Bernardo Oyarzun Rivera; Ruben Maas; Gijsbert Rispens; Achintya Kundu; et al 出版日期:2026-10-29 |
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(2025-6-4)