| 标题 |
Study of Poly-Si Etch Rate Sensitivity with Pulsing mode of RF Powers for Soft-Landing Step in Gate Patterning Process |
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| DOI | |
| 其它 |
期刊:2025 Conference of Science and Technology of Integrated Circuits (CSTIC) 作者:Chao Xu; Litian Xu; Chong Wu 出版日期:2025-03-24 |
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(2025-6-4)