| 标题 |
Characteristics of SiO2 Etching with a C4F8/Ar/CHF3/O2 Gas Mixture in 60-MHz/2-MHz Dual-frequency Capacitive Coupled Plasmas |
| 网址 | |
| DOI |
10.3938/jkps.59.3024
doi
|
| 其它 |
期刊:Journal of the Korean Physical Society 作者:M. H. Jeon; S-K. Kang; J. Y. Park; G. Y. Yeom 出版日期:2011-11-17 |
| 求助人 | |
| 下载 |
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(2025-6-4)