| 标题 |
OPC accuracy improvement through deep-learning based etch model |
| 网址 | |
| DOI |
10.1117/12.2613926
doi
|
| 其它 |
期刊:Advanced Etch Technology and Process Integration for Nanopatterning XI 作者:Weina Shi; Liang Zhu; Yuqian chen; Jiao Huang; Jinze Wang; et al 出版日期:2022-05-25 |
| 求助人 | |
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(2025-6-4)