| 标题 |
Irradiation-Source-Dependent Tone Conversion in Dry-Deposited Halogenated Amorphous Zeolitic Imidazolate Framework Resistsfor Electron-Beam and Extreme Ultraviolet Lithography |
| 网址 | |
| DOI | |
| 其它 |
期刊:ACS Applied Materials & Interfaces 作者:Jinhwan Byeon; Nick Gys; Jorid Smets; Ali Azimi; Lukas Nulens; et al 出版日期:2026-10-07 |
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(2025-6-4)