| 标题 |
Source optimization for less aggressive optical proximity correction in 0.55 NA logic single patterning |
| 网址 | |
| DOI | |
| 其它 |
期刊:Photomask Technology 2025 作者:Min-Woo Kim; Yu-Jin Chae; Hee-Chang Ko; Ji-Won Kang; Michael Yeung; et al 出版日期:2025 |
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