| 标题 |
Etching behavior of Y2O3 coatings in a capacitively coupled NF3/Ar/O2 plasma: Effects of bias power and pressure |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology A 作者:Yuning Wang; Liyue Gong; Ziyan Tan; Yongxin Liu; Fei Gao; et al 出版日期:2026-08-18 |
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(2025-6-4)