| 标题 |
Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted photochemical mechanical polishing (PCMP) |
| 网址 | |
| DOI | |
| 其它 |
期刊:Applied Surface Science 作者:Zihan Kou; Chao Wang; Wenjin Zhou; Ailian Chen; Yang Chen 出版日期:2024-02-20 |
| 求助人 | |
| 下载 |
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(2025-6-4)