| 标题 |
Accurate and Efficient Proximity Effect Correction for Electron Beam Lithography Based on Multilayer Perceptron Neural Network |
| 网址 | |
| DOI | |
| 其它 |
期刊:2022 International Workshop on Advanced Patterning Solutions (IWAPS) 作者:Wenze Yao; Yujie Yang; Jie Liu; Hongcheng Xu; Siyuan Zhang; et al 出版日期:2022-12-09 |
| 求助人 | |
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(2025-6-4)