| 标题 |
Characterization of Interfaces between HfO2 Thin Film and Metal Electrode with Pre–Post Treatments |
| 网址 | |
| DOI | |
| 其它 |
期刊:Japanese Journal of Applied Physics 作者:Young-Nam Kim 出版日期:2012-03-30 |
| 求助人 | |
| 下载 |
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(2025-6-4)