| 标题 |
Possible extreme ultraviolet mask thermal deformation during exposure |
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| DOI | |
| 其它 |
期刊:Journal of micro/nanopatterning, materials, and metrology 作者:Chung-Hyun Ban; In-Hwa Kang; Won-Yung Choi; Hye-Keun Oh 出版日期:2021-08-31 |
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(2025-6-4)