| 标题 |
Fluorocarbon (C4F8) assisted plasma-enhanced atomic layer etching (PEALE) of SiO2 with high repeatability of cycles in industrial ICP reactor. I. experiment |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology A 作者:D. V. Lopaev; D. R. Shibanov; T. V. Rakhimova; M. A. Bogdanova; A. V. Glotov; et al 出版日期:2026 |
| 求助人 | |
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(2025-6-4)