Surface defects engineering of BiFeO3 films for improved photoelectrochemical water oxidation

As a promising material for photoelectrochemical (PEC) water oxidation, the fast recombination rate and sluggish surface reaction for BiFeO 3 (BFO) still hinder its practical application. In this work, nitrogen plasma was first used to engineer surface defects of the pulsed laser deposition (PLD)-fabricated BFO films to suppress the surface charge recombination and improve the surface water oxidation activity, as well as enhance the stability. A remarkable photocatalytic activity enhancement was observed after the surface modification. Specifically, the photocurrent density is 95 μA/cm 2 at 0.6 V (vs. Ag/AgCl, pH=12.8) for BFO–N (after nitrogen plasma treatment), which is about 8 times higher than as-grown BFO (12 μA/cm 2 ) at the same potential. Meanwhile, the onset potential of BFO–N shifts toward the negative value by 120 mV compared to BFO. Also, the BFO–N reveals superior stability to BFO, which shows nearly no decay after the one-hour test. Complete experimental characterization and deep mechanistic analysis indicate that the enhanced performance could be due to the newly-formed Fe-enriched oxynitride layer on the surface after nitrogen plasma treatment, which suppresses the fast recombination, improves the water oxidation reaction kinetics, and protects the photoanode against photocorrosion. Our work offers a simple, but effective, way to improve the PEC performance of BFO, which is instructive for fabricating similar high-performance photoelectrodes for PEC applications.