材料科学
硅
光电子学
光学
可见光谱
纳米技术
物理
作者
Zhou, Zhenpeng,Li, Juntao,Su, Rongbin,Yao, Beimeng,Fang, Hanlin,Li, Kezheng,Zhou, Lidan,Liu, Jin,Stellinga, Daan,Reardon, Christopher P.,Krauss, Thomas F.,Wang, Xuehua
出处
期刊:University of Leeds, The University of Sheffield, University of York - White Rose Research Online
日期:2017-01-31
被引量:139
标识
DOI:10.1021/acsphotonics.6b00740
摘要
Dielectric metasurfaces require high refractive index contrast materials for optimum performance. This requirement imposes a severe restraint; either devices have been demonstrated at wavelengths of 700 nm and above using high-index semiconductors such as silicon, or they use lower index dielectric materials such as TiO2 or Si3N4 and operate in the visible wavelength regime. Here, we show that the high refractive index of silicon can be exploited at wavelengths as short as 532 nm by demonstrating a crystalline silicon metasurface with a transmission efficiency of 71% at this wavelength and a diffraction efficiency of 95% into the desired diffraction order. The metasurfaces consist of a graded array of silicon posts arranged in a square lattice on a quartz substrate. We show full 2π phase control, and we experimentally demonstrate polarization-independent beam deflection at 532 nm wavelength. Our results open a new way for realizing efficient metasurfaces based on silicon for the technologically all-important display applications.
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