材料科学
锐钛矿
锡
温度循环
成核
金红石
微观结构
拉曼光谱
纳米压痕
X射线光电子能谱
分层(地质)
沉积(地质)
化学工程
纳米技术
冶金
热的
化学
地质学
光催化
沉积物
生物化学
俯冲
有机化学
构造学
催化作用
气象学
古生物学
工程类
物理
光学
作者
M. Djafari Rouhani,Sai Bhavani Sravan Metla,Jonathan Hobley,Yeau‐Ren Jeng
标识
DOI:10.1016/j.apsusc.2023.158375
摘要
We determine the definitive failure mechanism of passivated TiN films by in-operando monitoring extreme temperature (650 °C) induced microstructure, chemical, and mechanical changes. Films were in-operando characterized using Raman and optical microscopy, in air and argon, and post-mortem using nanoindentation, XPS, XRD, and microscopy. Initially, TiO2 anatase forms from pre-existing anatase-rich nucleation centers. These develop into domed bulges of condensed N2 gas in the sub-surface. This initial oxidation is limited to the surface. However, during cooling, cracks propagate from the bubbles, leading to wide-area delamination of the films. These cracks provide a pathway for further destructive bulk oxidation to rutile. This insight into failure mechanism provides deposition protocol for coatings operated under demanding conditions.
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