Formation of a low-dilution pure copper layer by wire-based laser metal deposition with blue diode laser

材料科学 二极管 图层(电子) 激光器 光电子学 铜线 沉积(地质) 稀释 金属 半导体激光器理论 激光二极管 光学 冶金 复合材料 古生物学 物理 沉积物 生物 热力学
作者
Satoshi Yoshida,Masami Mizutani,Keisuke Takenaka,Yuji Sato,Masahiro Tsukamoto
标识
DOI:10.1117/12.3001994
摘要

A pure copper layer was formed on the stainless-steel substrate with low-dilution layer by a Wire-based Laser Metal Deposition method (W-LMD) with a blue diode laser. Pure copper is an important material for realization of a carbon-neutral society because of excellent properties such as electrical and thermal conductivity. As the demand of copper increases, a wide variety of processing methods are required with high yields. Thus, the LMD method, which is one of the Additive Manufacturing (AM) technologies, is focus on this study. The W-LMD is the process in which a metal wire is fed to the laser irradiation point and melted and solidified to form a layer. Conventional W-LMD with near-infrared fiber laser has formed a layer of Fe-based alloy, Ti-based alloy, Ni-based alloy, and so on. However, it was difficult to form a pure copper layer since light absorption rate of copper in this region was less than 10%. Therefore, we focused on blue light at the wavelength 450 nm. It is because light absorption rate of copper in blue region is 60%. Thus, the high-power blue diode laser has been developed and installed the W-LMD system. In this study, the pure copper layer was tried to form on the SS304 substrate with our W-LMD system. As the results, copper layer was formed with a layer thickness of 388 μm and a dilution thickness of 22 μm at the output power of 500 W, stage sweep speed of 10 mm/s, and wire feeding rate of 10 mm/s.

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