Stability of electron ptychography at low electron dose

Abstract Electron ptychography provides a promising avenue towards dose‐efficient, high‐resolution materials characterisation. Prior work demonstrates the feasibility of this approach, but an overarching view on the reliability of ptychographic images in low‐dose scenarios is required. Here, we address this limitation with a systematic study of image clarity across dose, thickness and convergence semi‐angle, on a range of materials science specimens. With the now widespread adoption of 4D‐STEM and ptychographic imaging, the establishment of the practical parameter space in which one can anticipate a reliably interpretable phase image is urgently needed. In some cases, our parameter space exploration confirms high‐resolution imaging at doses of 200 Å.